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Establishment of optimal {100} Si etching condition for N2H4-H2O solutions and application to electrochemical etching

Other Titles

N2H4-H2O 용액의 {100} Si에 대한 최적식각조건의 설정과 전기화학적 식각에의 응용

Authors

주병권; 이윤희; 김형곤; 오명환

Issue Date

1989-11

Citation

전자공학회 논문지, v.26, no.11, pp.56 - 60

URI

https://pubs.kist.re.kr/handle/201004/147298

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KIST Article > Others

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