Kinetics of chemical vapor deposition of Si on Ni substrate from a SiCl₄-H₂ gas precursor mixture

Title
Kinetics of chemical vapor deposition of Si on Ni substrate from a SiCl₄-H₂ gas precursor mixture
Authors
윤진국김긍호변지영이종권김재수홍경태
Keywords
deposition kinetics; chemical vapor deposition of Si; Ni-silicides; nickel
Issue Date
2003-07
Publisher
Surface and Coatings Technology
Citation
VOL 172, 65-71
URI
http://pubs.kist.re.kr/handle/201004/14768
ISSN
0257-8972
Appears in Collections:
KIST Publication > Article
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