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dc.contributor.authorKim Yong Tae-
dc.contributor.author이창우-
dc.date.accessioned2024-02-21T05:09:04Z-
dc.date.available2024-02-21T05:09:04Z-
dc.date.issued1995-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/148891-
dc.titleNitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization.-
dc.title.alternativeNitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization.-
dc.typeBook-
dc.citation.startPage910-
dc.citation.endPage913-
dc.relation.isPartOfSeriesIon implantation technology-94-
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