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New concept for amorphous diffusion barrier: Ion beam modification of metal/semiconductor interface.

Other Titles

New concept for amorphous diffusion barrier: Ion beam modification of metal/semiconductor interface.

Authors

Kim Yong Tae; S. K. Kwak; C. S. Kwon; D. J. Kim; C. W. Lee; I. H. Choi; Min Suk-Ki

Issue Date

1995-01

URI

https://pubs.kist.re.kr/handle/201004/148892

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KIST Publication > Others

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