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dc.contributor.authorKim Yong Tae-
dc.contributor.authorD. J. Kim-
dc.contributor.authorC. S. Kwon-
dc.contributor.authorI. H. Choi-
dc.contributor.authorMin Suk-Ki-
dc.date.accessioned2024-02-21T05:10:46Z-
dc.date.available2024-02-21T05:10:46Z-
dc.date.issued1994-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/148929-
dc.titleNitrogen implanted tungsten thin films for Cu diffusion barrier.-
dc.title.alternativeNitrogen implanted tungsten thin films for Cu diffusion barrier.-
dc.typeBook-
dc.citation.startPage?-
dc.citation.endPage?-
dc.relation.isPartOfSeries한국물리학회 제 69 회 학술논문 발표회-
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