Diamond thick film deposition in wafer scale using single-cathode direct current plasma assisted chemical vapour deposition

Title
Diamond thick film deposition in wafer scale using single-cathode direct current plasma assisted chemical vapour deposition
Authors
이욱성백영준채기웅
Keywords
DC plasma; diamond wafer; uniformity; large-area
Issue Date
2003-07
Publisher
Thin Solid Films
Citation
VOL 435, 89-94
URI
http://pubs.kist.re.kr/handle/201004/14934
ISSN
0040-6090
Appears in Collections:
KIST Publication > Article
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