Characteristics of hydrogen ion implantation for SOI fabrication

Title
Characteristics of hydrogen ion implantation for SOI fabrication
Authors
김형권변영태김태곤김선호한상국
Keywords
SOI 제작; 수소 이온 주입; TRIM 시뮬레이터; RBS channeling spectrum
Issue Date
2003-07
Publisher
한국광학회 2003 년도 하계학술발표회
Citation
, 230-231
URI
http://pubs.kist.re.kr/handle/201004/14954
Appears in Collections:
KIST Publication > Conference Paper
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