Blistering study on hydrogen ion implanted Si surface

Title
Blistering study on hydrogen ion implanted Si surface
Authors
김형권옥성해김재헌김선호변영태한상국우형주
Keywords
양성자 이온 주입; SOI; Blister 형성; 열처리
Issue Date
2003-05
Publisher
제 10 회 광전자 및 광통신 학술회의 (COOC 2003)
Citation
, 469-470
URI
http://pubs.kist.re.kr/handle/201004/15111
Appears in Collections:
KIST Publication > Conference Paper
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