Characteristics of W-N diffusion barrier by atomic layer chemical vapor deposition

Title
Characteristics of W-N diffusion barrier by atomic layer chemical vapor deposition
Authors
심현상김용태전형탁
Keywords
원자층증착; W-N확산방지막; 초고집적소자; 열적안정성
Issue Date
2002-02
Publisher
제9회 한국반도체학술대회
Citation
, 611-612
URI
http://pubs.kist.re.kr/handle/201004/15916
Appears in Collections:
KIST Publication > Conference Paper
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