Metalorganic atomic layer deposition of TiN Thim films using TDMAT and NH₃

Title
Metalorganic atomic layer deposition of TiN Thim films using TDMAT and NH₃
Authors
김효경김주연박진용김양도김영도전형탁김원목
Keywords
MOALD; TDMAT; TiN; Diffusion; barrier
Issue Date
2002-11
Publisher
Journal of the Korean Physical Society
Citation
VOL 41, NO 5, 739-744
URI
http://pubs.kist.re.kr/handle/201004/16011
ISSN
0374-4884
Appears in Collections:
KIST Publication > Article
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