Structural and micromechanical characteristics of low-dielectric organosilicate thin films modified by NH₃ plasma treatment

Title
Structural and micromechanical characteristics of low-dielectric organosilicate thin films modified by NH₃ plasma treatment
Authors
차국헌주상현김수한심현상김용태한진희이진규윤도영
Keywords
low-k; MSQ; interconnection
Issue Date
2001-05
Publisher
The Second Asian Conference on Chemical Vapor Deposition
Citation
, 48-51
URI
http://pubs.kist.re.kr/handle/201004/16430
Appears in Collections:
KIST Publication > Conference Paper
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