Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography

Title
Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography
Authors
이재형안광덕조의환
Keywords
193 nm (ArF) resist materials; Muliti-alicyclic polymers; Norbornene polymers
Issue Date
2001-02
Publisher
Polymer
Citation
VOL 42, NO 4, 1757-1761
URI
http://pubs.kist.re.kr/handle/201004/16665
ISSN
0032-3861
Appears in Collections:
KIST Publication > Article
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