Single precursor MOCVD of AlN thin films & the stoichiometry controlling

Title
Single precursor MOCVD of AlN thin films & the stoichiometry controlling
Authors
안창규경제홍조성훈한성환최승철Je-Hong Kyoung
Keywords
MOCVD; single precursor; AlN
Issue Date
2000-05
Publisher
2000 년도 한국재료학회 춘계 학술발표강연 및 논문개요집
Citation
, 97-97
URI
http://pubs.kist.re.kr/handle/201004/17255
Appears in Collections:
KIST Publication > Conference Paper
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