Atomic-layer chemical-vapor-deposition of TiN thin films on Si(100) and Si(111)

Title
Atomic-layer chemical-vapor-deposition of TiN thin films on Si(100) and Si(111)
Authors
김영석전형탁김영도김원목
Keywords
atomic layer epitaxy; CVD; TiN
Issue Date
2000-12
Publisher
Journal of the Korean Physical Society
Citation
VOL 37, NO 6, 1045-1050
URI
http://pubs.kist.re.kr/handle/201004/17438
ISSN
0374-4884
Appears in Collections:
KIST Publication > Article
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