Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia

Title
Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia
Authors
심현상김동준김용태전형탁
Keywords
atomic layer deposition; tungsten nitride; cyclic CVD
Issue Date
2000-01
Publisher
제7회 한국반도체학술대회 논문집; The 7th Korean Conference on Semiconductors
Citation
, 481-482
URI
http://pubs.kist.re.kr/handle/201004/17650
Appears in Collections:
KIST Publication > Conference Paper
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE