New method to prepare W-B+-N ternary barrier to Cu diffusion by implanting BF2+ ions into W-N thin film

Title
New method to prepare W-B+-N ternary barrier to Cu diffusion by implanting BF2+ ions into W-N thin film
Authors
김동준김용태박종완
Keywords
W-B+-N; diffusion barrier; BF2+; implantation; amorphous
Issue Date
1999-07
Publisher
Journal of Vacuum Science and Technology B
Citation
VOL 17, NO 4, 1598-1601
URI
http://pubs.kist.re.kr/handle/201004/17872
ISSN
1071-1023
Appears in Collections:
KIST Publication > Article
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