Effect of surface kinetics on the step coverage during chemical vapor deposition

Title
Effect of surface kinetics on the step coverage during chemical vapor deposition
Authors
황경순문상흡남석우신치범
Keywords
CVD; TEOS; SiO2; surface
Issue Date
1999-06
Publisher
Journal of materials research
Citation
VOL 14, NO 6, 2377-2380
URI
http://pubs.kist.re.kr/handle/201004/17942
ISSN
0884-2914
Appears in Collections:
KIST Publication > Article
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