The effect of Al-Ta2O5 topographic interface roughness on the leakage current of Ta2O5 thin films
- The effect of Al-Ta2O5 topographic interface roughness on the leakage current of Ta2O5 thin films
- Y. S. Kim; 이윤희; K. M. Lim; M. Y. Sung
- tantalum compounds; insulating thin films; sputtered coatings; leakage currents; interface roughness; Poole-Frenkel effect; atomic force microscopy; metal-insulator boundaries; thin film capacitors; MIM devices
- Issue Date
- Applied physics letters
- VOL 74, NO 19, 2800-2802
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- KIST Publication > Article
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