The effect of Al-Ta2O5 topographic interface roughness on the leakage current of Ta2O5 thin films

Title
The effect of Al-Ta2O5 topographic interface roughness on the leakage current of Ta2O5 thin films
Authors
Y. S. Kim이윤희K. M. LimM. Y. Sung
Keywords
tantalum compounds; insulating thin films; sputtered coatings; leakage currents; interface roughness; Poole-Frenkel effect; atomic force microscopy; metal-insulator boundaries; thin film capacitors; MIM devices
Issue Date
1999-05
Publisher
Applied physics letters
Citation
VOL 74, NO 19, 2800-2802
URI
http://pubs.kist.re.kr/handle/201004/17960
ISSN
0003-6951
Appears in Collections:
KIST Publication > Article
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