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Issue DateTitleAuthor(s)
198801A study on the nucleation, growth and shrinkage of oxidation induced stacking faults(OSF), part I: nucleation and thermal behavior of oxidation induced stacking faults.김용태; 김춘근; 민석기
199001Characteristics of plasma enhanced chemical vapor deposition tungsten thin films.김용태; 민석기; 홍종성; 김충기
199909Effects of Bi-Pt alloy on electrical characteristics of Pt/SrBi2Ta2O9/CeO2/Si ferroelectric gate structure김용태; 신동석; 박영균; 최인훈
199608Direct shrinkage observation of oxidation induced stacking faults in p-type CZ silicon.김용태; 민석기
199704Characteristics of SrBi//2Ta//2O//9/CeO//2/Pt/Si structure for non-volatile memory device이호녕; 김용태; 이창우; 신동석; 조성호
199308Performance of plasma deposited tungsten nitride diffusion barrier for Al and Au metallizations.김용태; 이창우; 민석기
199401구리확산 방지막으로서 TiW/WNx 이중층의 열적안정성에 관한 연구김용태; 김동준; 박종완; 권철순; 민석기
199401Comparison of high temperature thermal stability of Ru and RuO//2 schottky contact to GaAs.김용태; S. K. Kwak; C. W. Lee; J. G. Lee; C. S. Kwon; K. S. Jung; 민석기
199401Nitrogen implanted tungsten thin films for Cu diffusion barrier.김용태; D. J. Kim; C. S. Kwon; I. H. Choi; 민석기
199905InGaN epilayer 의 투과 스펙트럼 비교 및 광특성 분석김제원; 박영균; 김성일; 김용태; 최인훈; 이석헌; 이정희