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Issue DateTitleAuthor(s)
199702Characteristics of amorphous Ta-Si-N thin film for Cu metallization김동준; 정순필; 김용태; 민석기; 박종완
199803Electrical properties of a W-B-N Schottky contact to GaAs김용태; 이창우; 김동준
199501질소이온 주입된 질화텅스텐박막의 구리배선용 확산방지막 특성 .김용태; 권철순; 김동준; 민석기
199401구리확산 방지막으로서 TiW/WNx 이중층의 열적안정성에 관한 연구김용태; 김동준; 박종완; 권철순; 민석기
199803Effects of nitrogen ion implantation on the thermal stability of tungsten thin films김용태; 권철순; 김동준; 박종완; 이창우
200104Correlation between surface modification of HSQ films and phase transformation of Cu/W-N bilayers deposition on the NH3 plasma treated HSQ films김동준; 심현상; 박종완; 김용태; 김성일; 김춘근
200201Characteristics of plasma enhanced chemical vapor deposited W-B-N thin films김동준; 심현상; 김성일; 김용태; 전형탁
200006Digital deposition of tungsten nitride thin layer by cyclic exposure of WF//6 and NH₃심현상; 김동준; 김용태; 전형탁; 박영균; 김성일
200010Improvement in the characteristics of ammonia plasma treated MSQ(Methyl Silsesquioxane)심현상; 김동준; 김춘근; 김성일; 김용태; 전형탁
200001Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia심현상; 김동준; 김용태; 전형탁

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