Characteristics of TiNx/n-Si Schottky diodes deposited by reactive magnetron sputtering

Title
Characteristics of TiNx/n-Si Schottky diodes deposited by reactive magnetron sputtering
Authors
C. A. Dimitriadis이정일P. PatsalasS. LogothetidisD. H. TassisJ. BriniG. Kamarinos
Keywords
reactive magnetron sputtering
Issue Date
1999-04
Publisher
Journal of applied physics
Citation
VOL 85, NO 8, 4238-4242
URI
http://pubs.kist.re.kr/handle/201004/18070
ISSN
0021-8979
Appears in Collections:
KIST Publication > Article
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