Aluminum nitride thin film deposition using noble single precursor by MOCVD

Title
Aluminum nitride thin film deposition using noble single precursor by MOCVD
Authors
경제홍조성훈한성환최승철
Keywords
AlN; MOCVD; single precursor
Issue Date
1999-04
Publisher
1999년도 춘계총회, 초청·특별강연, 연구발표회
Citation
, 102-102
URI
http://pubs.kist.re.kr/handle/201004/18096
Appears in Collections:
KIST Publication > Conference Paper
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