Reactive ion etching characteristics of permalloy thin films

Title
Reactive ion etching characteristics of permalloy thin films
Authors
김성동이정중임상호김희중
Keywords
reactive ion etching; permalloy thin films; etching rate; etching damage; coercivity
Issue Date
1999-01
Publisher
日本應用磁氣學會誌; Journal of the magnetics society of Japan
Citation
VOL 23, NO 1-2, 252-254
URI
http://pubs.kist.re.kr/handle/201004/18425
ISSN
0285-0192
Appears in Collections:
KIST Publication > Article
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