Characterization of thick diamond film wafer grown by multi-cathode Direct Current (DC) Plasma Assisted Chemical Vapor Deposition (PACVD)

Title
Characterization of thick diamond film wafer grown by multi-cathode Direct Current (DC) Plasma Assisted Chemical Vapor Deposition (PACVD)
Authors
이재갑이욱성은광용백영준
Keywords
large area diamond deposition
Issue Date
1998-06
Publisher
Proc. of International Workshop on Surface Engineering and Technology, 1998, Bangalore, India
Citation
, 7-7
URI
http://pubs.kist.re.kr/handle/201004/18761
Appears in Collections:
KIST Publication > Conference Paper
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