Enhancement of selective chemical vapor deposition of copper by nitrogen plasma pretreatment

Title
Enhancement of selective chemical vapor deposition of copper by nitrogen plasma pretreatment
Authors
김영석김동준곽성관김은규민석기정동근
Keywords
selective growth
Issue Date
1998-04
Publisher
Japanese Journal of Applied Physics, Part 2 - Letters
Citation
VOL 37, NO 4B, L462-L464
URI
http://pubs.kist.re.kr/handle/201004/18856
ISSN
0021-4922
Appears in Collections:
KIST Publication > Article
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