Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists

Title
Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists
Authors
강종희신중한이재형김준우김종만한동근안광덕박재근문성윤문봉석
Issue Date
1998-10
Publisher
한국고분자학회 , 구미 금오공대 , 1998. 10. 16-17.
Citation
, 249-249
URI
http://pubs.kist.re.kr/handle/201004/19129
Appears in Collections:
KIST Publication > Conference Paper
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