Nanostructured Ta-Si-N diffusion barriers for Cu metallization

Title
Nanostructured Ta-Si-N diffusion barriers for Cu metallization
Authors
김동준김용태박종완
Keywords
nanostructure; Ta-Si-N; diffusion barrier; Cu metallization
Issue Date
1997-11
Publisher
Journal of applied physics.
Citation
VOL 82, NO 10, 4847-4851
URI
http://pubs.kist.re.kr/handle/201004/19669
Appears in Collections:
KIST Publication > Article
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