Electrical resistivity of copper films by partially ionized beam deposition

Title
Electrical resistivity of copper films by partially ionized beam deposition
Authors
고석근S. HanK. H. YoonK. H. KimH. G. JangS. C. Choi정형진
Issue Date
1997-01
Publisher
Mat. res. soc. symp. proc.
Citation
VOL 438, 381-386
URI
http://pubs.kist.re.kr/handle/201004/19938
Appears in Collections:
KIST Publication > Article
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