High quality silicon-nitride thin films grown by helium plasma-enhanced chemical vapor deposition

Title
High quality silicon-nitride thin films grown by helium plasma-enhanced chemical vapor deposition
Authors
S. LimS. J. Kim정재훈주병권오명환J. F. Wager
Keywords
insulating film; field emission display
Issue Date
1996-07
Publisher
Technical digest of 9th international vacuum microelectronics conference, St. Petersburg, Russia.
Citation
, 406-410
URI
http://pubs.kist.re.kr/handle/201004/20113
Appears in Collections:
KIST Publication > Conference Paper
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