Photochemical acid generation and resist application of camphorsulfonyloxymaleimide copolymers.

Title
Photochemical acid generation and resist application of camphorsulfonyloxymaleimide copolymers.
Authors
안광덕정찬문
Issue Date
1996-01
Publisher
Journal of photopolymer science and technology
Citation
v. 9, no. 4, 553-556
URI
http://pubs.kist.re.kr/handle/201004/20372
Appears in Collections:
KIST Publication > Article
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