Characteristics of silicon oxide films prepared by chemical vapor deposition and dry oxidation method using ECR plasma sources.

Title
Characteristics of silicon oxide films prepared by chemical vapor deposition and dry oxidation method using ECR plasma sources.
Authors
전법주허정수윤용수정일현오인환임태훈
Issue Date
1996-01
Publisher
Theories and applications of chem. res.
Citation
VOL 2, NO 1, 933-?
URI
http://pubs.kist.re.kr/handle/201004/20435
Appears in Collections:
KIST Publication > Conference Paper
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