Chemical vapor deposition of copper films : influence of the seeding layers.

Title
Chemical vapor deposition of copper films : influence of the seeding layers.
Authors
고석근윤경렬김석최두진김기환
Issue Date
1996-01
Publisher
Mat. res. soc. proc.
Citation
v. 427, 225-?
URI
http://pubs.kist.re.kr/handle/201004/20479
Appears in Collections:
KIST Publication > Article
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