Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization.

Title
Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization.
Authors
김용태이창우
Issue Date
1995-01
Publisher
Ion implantation technology-94
Citation
, 910-913
URI
http://pubs.kist.re.kr/handle/201004/20832
Appears in Collections:
KIST Publication > ETC
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