Etching characteristics of magnetic thin films by ion beam technique.

Title
Etching characteristics of magnetic thin films by ion beam technique.
Authors
노태환H. C. LeeS. D. KimS. H. HanH. J. Kim
Issue Date
1995-01
Publisher
Proceedings of the third international symposium on physics of magnetic materials (ISPMM 95), Seoul,
Citation
, 417-?
URI
http://pubs.kist.re.kr/handle/201004/20868
Appears in Collections:
KIST Publication > Conference Paper
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