Characteristics of etching for Al//0//.//3Ga//0//.//7As/GaAs multilayer.

Title
Characteristics of etching for Al//0//.//3Ga//0//.//7As/GaAs multilayer.
Authors
김성일민석기민병돈김무성S. K. ParkC. Lee
Keywords
MOCVD
Issue Date
1995-01
Publisher
The 3rd Korean semiconductor conference
Citation
, ?-?
URI
http://pubs.kist.re.kr/handle/201004/20935
Appears in Collections:
KIST Publication > Conference Paper
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