Thermal stability of plasma deposited tungsten nitride thin films for VLSI devices.

Title
Thermal stability of plasma deposited tungsten nitride thin films for VLSI devices.
Authors
김용태이창우권철순
Issue Date
1994-06
Publisher
1-st China-Korea sym. on thin film materials
Citation
, ?-?
URI
http://pubs.kist.re.kr/handle/201004/21033
Appears in Collections:
KIST Publication > Conference Paper
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