Characteristics of plasma deposited tungsten nitride thin films.

Title
Characteristics of plasma deposited tungsten nitride thin films.
Authors
김용태이창우민석기
Issue Date
1993-01
Publisher
Appl. phys. lett.
Citation
v. 62, 3312-3314
URI
http://pubs.kist.re.kr/handle/201004/21459
Appears in Collections:
KIST Publication > Article
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