Observation of oxide film formed at Si-Si bonding interface in SFB process

Title
Observation of oxide film formed at Si-Si bonding interface in SFB process
Authors
주병권오명환차균현
Keywords
micromachining; wafer direct bonding; interfacial oxide
Issue Date
1992-01
Publisher
전자공학회논문지
Citation
VOL 29A, NO 1, 41-47
URI
http://pubs.kist.re.kr/handle/201004/21564
Appears in Collections:
KIST Publication > Article
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