Growth and characterization of silicon-nitride films by plasma-enhanced chemical vapor deposition

Title
Growth and characterization of silicon-nitride films by plasma-enhanced chemical vapor deposition
Authors
강광남이정일J. H. Jo한일기Y. J. Lee
Keywords
silicon-nitride
Issue Date
1991-01
Publisher
Applied surface science
Citation
v. 48/49, 104-?
URI
http://pubs.kist.re.kr/handle/201004/21835
ISSN
0169-4332
Appears in Collections:
KIST Publication > Article
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