Effects of fluid flow on the chemical vapor deposition of Si in the system SiH//4-H//2.

Title
Effects of fluid flow on the chemical vapor deposition of Si in the system SiH//4-H//2.
Authors
조성욱이경우조영환윤종규
Keywords
chemical vapor deposition; numerical simulation; thin film; fluid flow
Issue Date
1990-09
Publisher
한국표면공학회지; Journal of the Korean institute of surface engineering
Citation
v. 23, no. 3, 160-165
URI
http://pubs.kist.re.kr/handle/201004/21904
Appears in Collections:
KIST Publication > Article
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