Microwave plasma enhanced chemical vapor deposition of silicon nitride films.

Title
Microwave plasma enhanced chemical vapor deposition of silicon nitride films.
Authors
김용태김춘근민석기
Issue Date
1989-01
Publisher
J. Kor. phys. soc.
Citation
v. 22, 197-202
URI
http://pubs.kist.re.kr/handle/201004/22126
Appears in Collections:
KIST Publication > Article
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