Dependence of dielectric cap quantum well disordering on the characteristics of dielectric capping film

Title
Dependence of dielectric cap quantum well disordering on the characteristics of dielectric capping film
Authors
최원준
Keywords
dielectric cap quantum well intermixing; SiN film; PECVD
Issue Date
2000-01
Publisher
Qantum well intermixing : material properties and optoelectronic application
Citation
, 443-469
URI
http://pubs.kist.re.kr/handle/201004/22811
Appears in Collections:
KIST Publication > ETC
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