Novel titanium complexes for MOCVD of titanium dioxide films with ultra-high deposition rate.

Title
Novel titanium complexes for MOCVD of titanium dioxide films with ultra-high deposition rate.
Authors
우경자
Keywords
design; synthesis; Ti precursor; MOCVD; deposition rate; TiO2 film
Issue Date
2002-08
Publisher
Book of Abstract 224th ACS National Meeting
Citation
VOL Part 1 of 2, # inor 638.-# inor 638.
URI
http://pubs.kist.re.kr/handle/201004/23112
Appears in Collections:
KIST Publication > Conference Paper
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