Characteristics of pulse plasma enhanced atomic layer deposition of tungsten nitride diffusion barrier for copper interconnect

Title
Characteristics of pulse plasma enhanced atomic layer deposition of tungsten nitride diffusion barrier for copper interconnect
Authors
심현상김용태전형탁
Keywords
펄스플라즈마; 원자층증착; cu-interconnect; diffusion barrier기술
Issue Date
2002-08
Publisher
AVS Topical Conference on Atomic Layer Deposition
Citation
, 67-67
URI
http://pubs.kist.re.kr/handle/201004/23117
Appears in Collections:
KIST Publication > Conference Paper
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