Comparison of TiN and TiAlN as a diffusion barrier deposited by atomic layer deposition

Title
Comparison of TiN and TiAlN as a diffusion barrier deposited by atomic layer deposition
Authors
김주영김효겸김양도김영도김원목전형탁
Keywords
diffusion barrier
Issue Date
2002-01
Publisher
Journal of the Korean Physical Society
Citation
VOL 40, NO 1, 176-179
URI
http://pubs.kist.re.kr/handle/201004/23559
ISSN
0374-4884
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE