The deposition behavior of SiO₂-TiO₂ thin film by metalorganic chemical vapor deposition method
- The deposition behavior of SiO₂-TiO₂ thin film by metalorganic chemical vapor deposition method
- 이시무; 박정훈; 홍국선; 조운조; 김동래
- TiO₂; thin film; chemical vapor deposition; metal organic
- Issue Date
- Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society
- VOL 18, NO 5, 2384-2388
- Appears in Collections:
- KIST Publication > Article
- Files in This Item:
There are no files associated with this item.
- RIS (EndNote)
- XLS (Excel)
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.