The deposition behavior of SiO₂-TiO₂ thin film by metalorganic chemical vapor deposition method

Title
The deposition behavior of SiO₂-TiO₂ thin film by metalorganic chemical vapor deposition method
Authors
이시무박정훈홍국선조운조김동래
Keywords
TiO₂; thin film; chemical vapor deposition; metal organic
Issue Date
2000-09
Publisher
Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society
Citation
VOL 18, NO 5, 2384-2388
URI
http://pubs.kist.re.kr/handle/201004/23747
ISSN
0734-2101
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE