Thermal stability enhancement of Cu/WN/SiOF/Si multilayers by post-plasma treatment of fluorine-doped silicon dioxide

Title
Thermal stability enhancement of Cu/WN/SiOF/Si multilayers by post-plasma treatment of fluorine-doped silicon dioxide
Authors
이석형김동준양성훈박정원손세일오경희김용태김정열염근영박종완
Keywords
Cu/WN/SiOF/Si; Reliability; Post-Plasma Treatment
Issue Date
1999-01
Publisher
Journal of applied physics
Citation
VOL 85, NO 1, 473-477
URI
http://pubs.kist.re.kr/handle/201004/24086
ISSN
0021-8979
Appears in Collections:
KIST Publication > Article
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