Reliability of Cu/W-N thin films deposited on low dielectric constant SiO:F ILD

Title
Reliability of Cu/W-N thin films deposited on low dielectric constant SiO:F ILD
Authors
이석형김동준양성훈박정원손세일오경희김용태박종완
Keywords
Low-K
Issue Date
1998-04
Publisher
MRS 98'
Citation
, ?-?
URI
http://pubs.kist.re.kr/handle/201004/24193
Appears in Collections:
KIST Publication > Conference Paper
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