Low temperature growth of oxide thin films by metalorganic chemical vapor deposition

Title
Low temperature growth of oxide thin films by metalorganic chemical vapor deposition
Authors
염상섭
Keywords
MOCVD
Issue Date
1998-01
Publisher
Integrated ferroelectrics
Citation
VOL 20, 55-64
URI
http://pubs.kist.re.kr/handle/201004/24282
ISSN
1058-4587
Appears in Collections:
KIST Publication > Article
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