Bisethylacetoacetato Cu(II) as a novel metal-organic precursor for Cu film production by plasma-enhanced chemical vapor deposition toward ultra-large-scale integration metallization.

Title
Bisethylacetoacetato Cu(II) as a novel metal-organic precursor for Cu film production by plasma-enhanced chemical vapor deposition toward ultra-large-scale integration metallization.
Authors
김주희최형수조영상이경옥김경숙최광진Soon T. HwangIlwun Shim
Keywords
bisethylacetoacetato Cu(II)
Issue Date
1996-05
Publisher
Journal of materials research
Citation
v. 11, no. 5, 1051-1060
URI
http://pubs.kist.re.kr/handle/201004/24480
ISSN
0884-2914
Appears in Collections:
KIST Publication > Article
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